TY  - BOOK
AU  - Chen, Yi-Ling
PY  - 2014
DA  - 2014//
TI  - Plasma diagnostics applying K-line emission profiles of Si and Ar
AB  - Modifications of K-line profiles due to a warm dense plasma environment are a suitable tool for plasma diagnostics since X-ray emissions strongly depend on the ion configuration an emitter environment. The plasma environment leads to a red shift increasing at higher free electron density and rising temperature. Alternatively, excited states and ionized emitter configurations lead to a blue shift. Both shifts have been taken into account for the calculation of line profiles of silicon and argon.
UR  - http://rosdok.uni-rostock.de/resolve?urn=urn:nbn:de:gbv:28-diss2015-0040-3
UR  - http://rosdok.uni-rostock.de/resolve?urn=urn:nbn:de:gbv:28-diss2015-0040-3&pdf
UR  - http://nbn-resolving.de/urn:nbn:de:gbv:28-diss2015-0040-3
LA  - English
N1  - presented by Chen Yi-Ling
ID  - 818328576
ER  -