%0 Book
%T Plasma diagnostics applying K-line emission profiles of Si and Ar
%A Chen, Yi-Ling
%D 2014
%G English
%F 818328576
%O presented by Chen Yi-Ling
%O Rostock, Univ., Mathematisch-Naturwiss. Fak., Diss., 2014
%X Modifications of K-line profiles due to a warm dense plasma environment are a suitable tool for plasma diagnostics since X-ray emissions strongly depend on the ion configuration an emitter environment. The plasma environment leads to a red shift increasing at higher free electron density and rising temperature. Alternatively, excited states and ionized emitter configurations lead to a blue shift. Both shifts have been taken into account for the calculation of line profiles of silicon and argon.
%L 530.446
%9 theses
%9 Text
%9 Hochschulschrift
%U http://rosdok.uni-rostock.de/resolve?urn=urn:nbn:de:gbv:28-diss2015-0040-3
%U http://rosdok.uni-rostock.de/resolve?urn=urn:nbn:de:gbv:28-diss2015-0040-3&pdf
%U http://nbn-resolving.de/urn:nbn:de:gbv:28-diss2015-0040-3