Plasma diagnostics applying K-line emission profiles of Si and Ar Silicium Argon Chen, Yi-Ling , 1984- Text theses Text Hochschulschrift 2014 2014 eng electronic resourceremoteComputermedienOnline-Ressourcetext/htmlapplication/pdfOnline-Ressource graph. Darst. Modifications of K-line profiles due to a warm dense plasma environment are a suitable tool for plasma diagnostics since X-ray emissions strongly depend on the ion configuration an emitter environment. The plasma environment leads to a red shift increasing at higher free electron density and rising temperature. Alternatively, excited states and ionized emitter configurations lead to a blue shift. Both shifts have been taken into account for the calculation of line profiles of silicon and argon. presented by Chen Yi-Ling Rostock, Univ., Mathematisch-Naturwiss. Fak., Diss., 2014 530.446 530 UR 8200 33.80 http://rosdok.uni-rostock.de/resolve?urn=urn:nbn:de:gbv:28-diss2015-0040-3 http://rosdok.uni-rostock.de/resolve?urn=urn:nbn:de:gbv:28-diss2015-0040-3&pdf http://nbn-resolving.de/urn:nbn:de:gbv:28-diss2015-0040-3 Plasma diagnostics applying K-line emission profiles of Si and Ar--(DE-627)816833206 urn:nbn:de:gbv:28-diss2015-0040-3 oclc: 935809928 ppn: (DE-627)818328576