@Book{818328576,
author="Chen, Yi-Ling",
title="Plasma diagnostics applying K-line emission profiles of Si and Ar",
year="2014",
abstract="Modifications of K-line profiles due to a warm dense plasma environment are a suitable tool for plasma diagnostics since X-ray emissions strongly depend on the ion configuration an emitter environment. The plasma environment leads to a red shift increasing at higher free electron density and rising temperature. Alternatively, excited states and ionized emitter configurations lead to a blue shift. Both shifts have been taken into account for the calculation of line profiles of silicon and argon.",
note="presented by Chen Yi-Ling",
note="Rostock, Univ., Mathematisch-Naturwiss. Fak., Diss., 2014",
url="http://rosdok.uni-rostock.de/resolve?urn=urn:nbn:de:gbv:28-diss2015-0040-3",
url="http://rosdok.uni-rostock.de/resolve?urn=urn:nbn:de:gbv:28-diss2015-0040-3&pdf",
url="http://nbn-resolving.de/urn:nbn:de:gbv:28-diss2015-0040-3",
language="English"
}